JPH0150844B2 - - Google Patents

Info

Publication number
JPH0150844B2
JPH0150844B2 JP54500645A JP50064579A JPH0150844B2 JP H0150844 B2 JPH0150844 B2 JP H0150844B2 JP 54500645 A JP54500645 A JP 54500645A JP 50064579 A JP50064579 A JP 50064579A JP H0150844 B2 JPH0150844 B2 JP H0150844B2
Authority
JP
Japan
Prior art keywords
mask
light
lens
image
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54500645A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55500510A (en]
Inventor
Kenesu Reui
Hooru Sandorando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KEI ERU EI INSUTORUMENTSU CORP
Original Assignee
KEI ERU EI INSUTORUMENTSU CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KEI ERU EI INSUTORUMENTSU CORP filed Critical KEI ERU EI INSUTORUMENTSU CORP
Publication of JPS55500510A publication Critical patent/JPS55500510A/ja
Publication of JPH0150844B2 publication Critical patent/JPH0150844B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Automatic Focus Adjustment (AREA)
  • Drying Of Semiconductors (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)
JP54500645A 1978-04-03 1979-04-02 Expired JPH0150844B2 (en])

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/892,972 US4247203A (en) 1978-04-03 1978-04-03 Automatic photomask inspection system and apparatus

Publications (2)

Publication Number Publication Date
JPS55500510A JPS55500510A (en]) 1980-08-14
JPH0150844B2 true JPH0150844B2 (en]) 1989-10-31

Family

ID=25400807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54500645A Expired JPH0150844B2 (en]) 1978-04-03 1979-04-02

Country Status (3)

Country Link
US (1) US4247203A (en])
JP (1) JPH0150844B2 (en])
WO (1) WO1979000876A1 (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0366385A (ja) * 1989-07-21 1991-03-22 Iomed Inc 水化可能生体電極

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NL7409850A (nl) * 1974-07-22 1976-01-26 Philips Nv Werkwijze en inrichting voor het testen van een tweedimensionaal patroon.
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0366385A (ja) * 1989-07-21 1991-03-22 Iomed Inc 水化可能生体電極

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JPS55500510A (en]) 1980-08-14
WO1979000876A1 (en) 1979-11-01
US4247203A (en) 1981-01-27

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